High-Resolution UHV-XPS System for Enhanced Time-Resolved Photoelectron Spectroscopy Applications
Shang-Hsien Hsieh1*, Chia-Hao Chen1,2, Ping-Hui Lin1, Ming-Chang Chen1,3,4, Chih-Wei Luo1,2,5,6,7
1Scientific Research Division, National Synchrotron Radiation Research Center, Hsinchu, Taiwan
2Department of Electrophysics, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
3Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, Taiwan
4Department of Physics, National Tsing Hua University, Hsinchu, Taiwan
5Taiwan Consortium of Emergent Crystalline Materials (TCECM), National Science and Technology Council, Taipei, Taiwan
6Institute of Physics and Center for Emergent Functional Matter Science, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
7Department of Physics, University of Washington, Seattle, Washington, USA
* Presenter:Shang-Hsien Hsieh, email:hsieh.steven@nsrrc.org.tw
The National Synchrotron Radiation Research Center (NSRRC) is developing an Ultra-High Vacuum X-ray Photoelectron Spectroscopy (UHV-XPS) end-station at the TPS 43A1 beamline to study fast dynamic processes in advanced materials. This TPS 43A beamline will house three sequential experimental end-stations: a UHV-XPS system for conventional XPS and Time-Resolved Photoelectron Spectroscopy (Tr-PES), as well as two Ambient Pressure XPS (APXPS I and II) stations for high-pressure experiments. The UHV-XPS station will feature dual analyzers from SPECS GmbH: the PHOIBOS 225 hemispherical analyzer and the THEMIS 1000 Time-of-Flight Spectrometer, enabling measurements of XPS, Tr-PES, and Auger electron-Photoelectron coincident spectroscopy (APECS) within one integrated setup. The beamline’s design includes a high-resolution, high-flux undulator with a flexible active mirror (AM) and plane gratings (PG), supporting an energy range between 200 and 3000 eV and delivering an average photon flux of 1x10^13 photons/s. This setup provides an energy resolving power of at least 10,000 throughout the entire energy range. The focused beam size for UHV-XPS is 9(H) x 5(V) μm², while the APXPS I and II stations have beam sizes of 23(H) x 9(V) μm² and 37(H) x 12(V) μm², respectively, allowing for highly detailed and precise material characterization.
Keywords: X-ray Photoelectron Spectroscopy, Synchrotron Radiation, Time-Resolved Photoelectron Spectroscopy